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Atomic nitrogen production in a molecular‐beam epitaxy compatible electron cyclotron resonance plasma source

 

作者: R. P. Vaudo,   J. W. Cook,   J. F. Schetzina,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  （AIP Available online 1994）
卷期: Volume 12, issue 2  

页码: 1232-1235

 

ISSN:1071-1023

 

年代: 1994

 

DOI:10.1116/1.587052

 

出版商: American Vacuum Society

 

关键词: MOLECULAR BEAM EPITAXY;PLASMA SOURCES;NITROGEN;ECR HEATING;EMISSION SPECTRA;NEAR INFRARED RADIATION;POWER RANGE 10−100 W;POWER RANGE 100−1000 W;HIGH VACUUM

 

数据来源: AIP

 

摘要:

The first high‐resolution study of the optical emission from nitrogen plasmas produced by an ASTeX compact electron cyclotron resonance (ECR) microwave plasma source is reported. The spectroscopic results clearly show that the ECR plasma source generates an appreciable flux of nitrogen atoms, as indicated by strong atomic emission lines in the near‐infrared spectral region, in addition to various species of molecular nitrogen.

 

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