首页   按字顺浏览 期刊浏览 卷期浏览 New photoluminescence lines in GaAs layers grown by metalorganic vapor phase epitaxy
New photoluminescence lines in GaAs layers grown by metalorganic vapor phase epitaxy

 

作者: A. P. Roth,   R. G. Goodchild,   S. Charbonneau,   D. F. Williams,  

 

期刊: Journal of Applied Physics  (AIP Available online 1983)
卷期: Volume 54, issue 6  

页码: 3427-3430

 

ISSN:0021-8979

 

年代: 1983

 

DOI:10.1063/1.332458

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A set of luminescence lines previously observed only in GaAs layers grown by molecular beam epitaxy (MBE) has been observed for the first time in layers grown by metalorganic vapor phase epitaxy (MOVPE). The lines which appear between 1.5515 and 1.504 eV are more evident in samples grown with low arsine concentrations and low substrate temperatures. It appears that these additional lines are due to recombinations involving native defects. Unlike the MBE case, extrinsic impurities from the reactants are incorporated in the layers during the growth, thus reducing the concentration of native defects responsible for the additional lines.

 

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