首页   按字顺浏览 期刊浏览 卷期浏览 Insitureflectance anisotropy studies of AlxGa1−xAs layers grown on GaAs(001) by m...
Insitureflectance anisotropy studies of AlxGa1−xAs layers grown on GaAs(001) by molecular beam epitaxy

 

作者: S. J. Morris,   J.‐Th. Zettler,   K. C. Rose,   D. I. Westwood,   D. A. Woolf,   R. H. Williams,   W. Richter,  

 

期刊: Journal of Applied Physics  (AIP Available online 1995)
卷期: Volume 77, issue 7  

页码: 3115-3120

 

ISSN:0021-8979

 

年代: 1995

 

DOI:10.1063/1.358663

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Reflectance anisotropy spectroscopy was used to examine the surfaces of AlxGa1−xAs layers grown on GaAs(001) by molecular beam epitaxy, where the Al mole fraction was varied across the whole composition rangex=(0.0,0.25,0.50,0.75,1.0). All surfaces were also independently characterized using reflection high‐energy electron diffraction, and were found to exhibit ac(4×4) reconstruction. After initial changes in the spectra were observed on depositing very thin layers (≤20 monolayers), in the intermediate thickness range a regime was entered in which strong optical interference effects appeared. These effects are accurately accounted for using a four‐media model. For thicker layers (≥8000 monolayers), interference effects were seen to diminish and spectra representative of the surfaces of bulk AlxGa1−xAs were obtained. ©1995 American Institute of Physics.

 

点击下载:  PDF (805KB)



返 回