Optical waveguides formed by low‐energy electron irradiation of silica
作者:
A. J. Houghton,
P. D. Townsend,
期刊:
Applied Physics Letters
(AIP Available online 1976)
卷期:
Volume 29,
issue 9
页码: 565-566
ISSN:0003-6951
年代: 1976
DOI:10.1063/1.89187
出版商: AIP
数据来源: AIP
摘要:
We have demonstrated that low‐energy electron irradiation of silica glass leads to a sufficient change in the refractive index to form optical waveguides. A peak enhancement of at least 0.9% is achieved by the deposition of some 1024keV cm−3and is stable to at least 200 °C. This energy requirement is consistent with measurements of lattice compaction in silica which also reaches a maximum value when ∼1024keV cm−3is deposited in ionization or electronic excitations. (The change is thought to be the result of irradiation damage). It is noted that changes induced in this way might have application in both integrated optics and graded index fibers.
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