Determination of hafnium‐p‐type silicon Schottky barrier height
作者:
M. Beguwala,
C. R. Crowell,
期刊:
Journal of Applied Physics
(AIP Available online 1974)
卷期:
Volume 45,
issue 6
页码: 2792-2794
ISSN:0021-8979
年代: 1974
DOI:10.1063/1.1663673
出版商: AIP
数据来源: AIP
摘要:
The Schottky barrier height for holes in hafnium (Hf)‐p‐type silicon junctions was determined to be 0.58±0.02 eV by current‐voltage, capacitance‐voltage, and photothreshold techniques. The barrier height determined here does not agree with the earlier reported value of 0.90 eV by Saxena. We have shown that interface effects can account for only minor changes—viz., 0.02 eV in our barrier height value. The reasons for the discrepancy with Saxena's value are not fully understood, but our results are consistent with those expected from conventional Schottky barrier models.
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