Use of electron beam techniques to study ion deposition in secondary ion mass spectrometry sputter craters
作者:
J. D. Brown,
F. G. Ru¨denauer,
期刊:
Journal of Applied Physics
(AIP Available online 1985)
卷期:
Volume 57,
issue 8
页码: 2727-2732
ISSN:0021-8979
年代: 1985
DOI:10.1063/1.335414
出版商: AIP
数据来源: AIP
摘要:
Electron beam techniques have been used to examine the topography and composition of sputter craters formed by an indium primary ion beam from a liquid metal ion source during secondary ion mass spectrometric analysis. Secondary electron images in a scanning electron microscope revealed the crater topography but the presence of implanted In from the primary ion beam could not be detected using an energy dispersive x‐ray detector. Auger electron spectroscopy was used to detect the presence of In in the craters, and to establish the qualitative distribution of elements in and around the craters at the surface. Surface contamination of the specimens prevented quantitative interpretation. The total indium concentration distribution across the craters was measured in an electron probe microanalyzer with a crystal spectrometer. The technique can be used to measure total In in the bottom of the crater from which total sputter yield can be obtained.
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