Localized density of states in amorphous silicon determined by electrophotography
作者:
O. Imagawa,
T. Akiyama,
K. Shimakawa,
期刊:
Applied Physics Letters
(AIP Available online 1984)
卷期:
Volume 45,
issue 4
页码: 438-439
ISSN:0003-6951
年代: 1984
DOI:10.1063/1.95250
出版商: AIP
数据来源: AIP
摘要:
We report that the distribution of localized density of statesg(E) for hydrogenated amorphous silicon can be estimated by the electrophotographic (xerographic) method. The density of states near midgap can be evaluated to be about 1×1016 cm−3 eV−1for undoped films. The general trend and the shape ofg(E) are similar to those obtained by the deep level transient spectroscopy and the photothermal deflection spectroscopy.
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