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Localized density of states in amorphous silicon determined by electrophotography

 

作者: O. Imagawa,   T. Akiyama,   K. Shimakawa,  

 

期刊: Applied Physics Letters  (AIP Available online 1984)
卷期: Volume 45, issue 4  

页码: 438-439

 

ISSN:0003-6951

 

年代: 1984

 

DOI:10.1063/1.95250

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We report that the distribution of localized density of statesg(E) for hydrogenated amorphous silicon can be estimated by the electrophotographic (xerographic) method. The density of states near midgap can be evaluated to be about 1×1016 cm−3 eV−1for undoped films. The general trend and the shape ofg(E) are similar to those obtained by the deep level transient spectroscopy and the photothermal deflection spectroscopy.

 

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