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Influence of the sputtering gas pressure on deposition profiles

 

作者: G. González‐Díaz,   I. Mártil,   F. Sánchez‐Quesada,   M. Rodríguez‐Vidal,   A. Gras‐Martí,   J. A. Vallés‐Abarca,  

 

期刊: Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films  （AIP Available online 1983）
卷期: Volume 1, issue 3  

页码: 1394-1397

 

ISSN:0734-2101

 

年代: 1983

 

DOI:10.1116/1.572028

 

出版商: American Vacuum Society

 

关键词: thin films;thickness;sputtering;spatial distribution;vapor pressure;deposition;argon;glass

 

数据来源: AIP

 

摘要:

Experimental thickness profiles of thin films deposited on substrates perpendicular to the target being sputtered show maxima whose position depends on the sputtering gas pressure. A simple model of particle slowing down in the transport stage accounts for this fact. The influence of diffusional transport on thin film profiles deposited on substrates both parallel and perpendicular to the target, can be estimated comparing experimental data with model predictions.

 

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