Device fabrication by nanolithography and electroplating for magnetic flux quantization measurements
作者:
E. Kratschmer,
A. Erko,
V. T. Petrashov,
H. Beneking,
期刊:
Applied Physics Letters
(AIP Available online 1984)
卷期:
Volume 44,
issue 10
页码: 1011-1013
ISSN:0003-6951
年代: 1984
DOI:10.1063/1.94602
出版商: AIP
数据来源: AIP
摘要:
100‐keVe‐beam lithography and electroplating of gold have been used to fabricate a device for the measurement of quantum changes in magnetic flux. The structure is defined in a 200‐nm‐thick layer of a copolymer of methyl methacrylate and methacrylic acid (PMMA/MAA) on top of a Si wafer covered by 150 nm of Si3N4. The device is a square frame of 2×2 &mgr;m2and 100‐nm linewidth. Gold was electroplated to a thickness of 100 nm. This technique allows the fabrication of high resolution, high aspect ratio gold structures.
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