Very low threshold current GaAs–AlGaAs GRIN‐SCH lasers grown by MBE for OEIC applications
作者:
T. Fujii,
S. Yamakoshi,
K. Nanbu,
O. Wada,
S. Hiyamizu,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena
(AIP Available online 1984)
卷期:
Volume 2,
issue 2
页码: 259-261
ISSN:0734-211X
年代: 1984
DOI:10.1116/1.582799
出版商: American Vacuum Society
关键词: threshold current;fabrication;semiconductor lasers;molecular beam epitaxy;gallium arsenides;efficiency;current density;integrated optics$;operation;field effect transistors;chemical composition;integrated circuits
数据来源: AIP
摘要:
Very highly efficient GaAs–AlGaAs GRIN–SCH lasers were grown on ann‐GaAs substrate as well as on a semi‐insulating GaAs substrate by MBE. The threshold current densityJthof the lasers was found to be minimum when the thickness of the GaAs quantum well active layer is 6 nm. The lowestJthof 260 A/cm2was achieved for the broad‐area Fabry–Perot laser (the Al composition of the cladding layerx=0.7, the cavity lengthL=400 μm). A ridge‐waveguide (5 μm wide stripe) GaAs–AlGaAs GRIN–SCH laser, which is monolithically integrated with GaAs MESFET’s on a semi‐insulating GaAs substrate, exhibited cw operation with a threshold current as low as 19 mA at room temperature.
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