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Very low threshold current GaAs–AlGaAs GRIN‐SCH lasers grown by MBE for OEIC applications

 

作者: T. Fujii,   S. Yamakoshi,   K. Nanbu,   O. Wada,   S. Hiyamizu,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena  (AIP Available online 1984)
卷期: Volume 2, issue 2  

页码: 259-261

 

ISSN:0734-211X

 

年代: 1984

 

DOI:10.1116/1.582799

 

出版商: American Vacuum Society

 

关键词: threshold current;fabrication;semiconductor lasers;molecular beam epitaxy;gallium arsenides;efficiency;current density;integrated optics$;operation;field effect transistors;chemical composition;integrated circuits

 

数据来源: AIP

 

摘要:

Very highly efficient GaAs–AlGaAs GRIN–SCH lasers were grown on ann‐GaAs substrate as well as on a semi‐insulating GaAs substrate by MBE. The threshold current densityJthof the lasers was found to be minimum when the thickness of the GaAs quantum well active layer is 6 nm. The lowestJthof 260 A/cm2was achieved for the broad‐area Fabry–Perot laser (the Al composition of the cladding layerx=0.7, the cavity lengthL=400 μm). A ridge‐waveguide (5 μm wide stripe) GaAs–AlGaAs GRIN–SCH laser, which is monolithically integrated with GaAs MESFET’s on a semi‐insulating GaAs substrate, exhibited cw operation with a threshold current as low as 19 mA at room temperature.

 

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