Far-infrared study of a laterally confined electron gas formed by molecular beam epitaxial regrowth on a patterned (100)n+-GaAs substrate
作者:
D. D. Arnone,
S. Cina,
J. H. Burroughes,
S. N. Holmes,
T. Burke,
H. P. Hughes,
D. A. Ritchie,
M. Pepper,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 71,
issue 4
页码: 497-499
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.119589
出版商: AIP
数据来源: AIP
摘要:
A method of producing lateral confinement of an electron gas has been realized by using molecular beam epitaxy to grow a high mobility heterostructure on a (100)n+-GaAs layer selectively etched to create a two-dimensional array of cavities through then+-GaAs, which are bound by higher index facets. Far-infrared cyclotron resonance (CR) spectra unambiguously demonstrate that the electron gas formed inside the cavities is confined in both lateral directions. Typical confinement energies of30 cm−1and widths of 2000 nm are derived from the spectra and magnetoresistance measurements. The effect of differentn+-GaAs backgate biases is also investigated. Combining information from CR spectra with atomic force microscopy images provides a picture of the nature of the lateral confinement in this structure. ©1997 American Institute of Physics.
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