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Far-infrared study of a laterally confined electron gas formed by molecular beam epitaxial regrowth on a patterned (100)n+-GaAs substrate

 

作者: D. D. Arnone,   S. Cina,   J. H. Burroughes,   S. N. Holmes,   T. Burke,   H. P. Hughes,   D. A. Ritchie,   M. Pepper,  

 

期刊: Applied Physics Letters  (AIP Available online 1997)
卷期: Volume 71, issue 4  

页码: 497-499

 

ISSN:0003-6951

 

年代: 1997

 

DOI:10.1063/1.119589

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A method of producing lateral confinement of an electron gas has been realized by using molecular beam epitaxy to grow a high mobility heterostructure on a (100)n+-GaAs layer selectively etched to create a two-dimensional array of cavities through then+-GaAs, which are bound by higher index facets. Far-infrared cyclotron resonance (CR) spectra unambiguously demonstrate that the electron gas formed inside the cavities is confined in both lateral directions. Typical confinement energies of30 cm−1and widths of 2000 nm are derived from the spectra and magnetoresistance measurements. The effect of differentn+-GaAs backgate biases is also investigated. Combining information from CR spectra with atomic force microscopy images provides a picture of the nature of the lateral confinement in this structure. ©1997 American Institute of Physics.

 

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