Effect of post‐deposition annealing on structure and chemistry of the TiN film/steel substrate interfaces
作者:
A. Erdemir,
C. C. Cheng,
期刊:
Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films
(AIP Available online 1991)
卷期:
Volume 9,
issue 3
页码: 439-443
ISSN:0734-2101
年代: 1991
DOI:10.1116/1.577429
出版商: American Vacuum Society
关键词: TITANIUM NITRIDES;FILMS;STEELS;INTERFACES;ANNEALING;HIGH TEMPERATURE;VERY HIGH TEMPERATURE;TRANSMISSION ELECTRON MICROSCOPY;CRYSTAL DEFECTS;TiN
数据来源: AIP
摘要:
This study deals with solid‐state phase transformations occurring at interfaces between a TiN film and an AISI M50 steel substrate during postdeposition annealing at 500 and 1000 °C. Cross‐sectional transmission electron microscopy (XTEM) was used to investigate the nature of phase transformations at these interfaces. The TiN films were ion plated onto M50 steel with an initial Ti underlayer at 100 °C. XTEM and electron energy loss spectroscopy of the interfaces indicated that the ion‐plated Ti underlayers transformed into a TiC phase during annealing at 500 °C and into a Ti(C,N) phase during annealing at 1000 °C. In addition, the density of defects within grains was significantly reduced during annealing and the grains themselves became larger.
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