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Combined method of focused ion beam milling and ion implantation techniques for the fabrication of high temperature superconductor Josephson junctions

 

作者: C.-H. Chen,   I. Jin,   S. P. Pai,   Z. W. Dong,   R. P. Sharma,   C. J. Lobb,   T. Venkatesan,   K. Edinger,   J. Orloff,   J. Melngailis,   Z. Zhang,   W. K. Chu,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  (AIP Available online 1998)
卷期: Volume 16, issue 5  

页码: 2898-2901

 

ISSN:1071-1023

 

年代: 1998

 

DOI:10.1116/1.590291

 

出版商: American Vacuum Society

 

关键词: YBa2Cu3O7

 

数据来源: AIP

 

摘要:

We have studied theTcdegradation of epitaxialYB2Cu3O7−x(YBCO) films on (100)LaAlO3substrates implanted with 100 keVO+ions at different conditions. The influence of Au mask thickness and the implantation doses on the film characteristics have been investigated systematically. YBCO bridges have been modified by local oxygen ion implantation at optimal condition through a narrow trench in an Au/photoresist mask, which was fabricated formed by focused ion beam milling and reactive ion etching. The critical current and normal resistance of the modified bridges were found to be characteristic of superconductor/normal/superconductor Josephson junction behavior. Microwave irradiation of the junctions resulted in Shapiro steps in theI–Vcharacteristics.

 

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