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Spectral response of boron‐implanted amorphous silicon Schottky diode

 

作者: T. Chikamura,   Y. Aoki,   K. Yano,   T. Komeda,   T. Ishihara,  

 

期刊: Journal of Applied Physics  (AIP Available online 1985)
卷期: Volume 57, issue 6  

页码: 2280-2284

 

ISSN:0021-8979

 

年代: 1985

 

DOI:10.1063/1.334376

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The spectral response of Schottky diodes on hydrogenated amorphous silicon implanted with boron has been investigated. The decrease in sensitivity in the short‐wavelength range has been observed in samples implanted with the boron dose of more than 1.6×1013ions/cm2. The experimental spectral responses are in good agreement with theoretical responses derived from the assumption that the photoexcited carriers are mainly transported by drift field.

 

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