The electrical properties of thin film (<1000 Å) capacitor devices of lithium niobate grown on silicon and platinum and of thicker film metal-ferroelectric-semiconductor field effect transistors (MFSFET) with lithium niobate as the gate material were measured. Dielectric constants of the thin films on silicon were as high as 27, while those for films on platinum were as high as 49. The MFSFET structures showed good FET properties, and demonstrated a channel current modulation consistent with switching of the ferroelectric gate by pulsing.