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Atomic oxygen effect on theinsitugrowth of stoichiometric YBa2Cu3O7−&dgr;epitaxial films by facing targets 90° off‐axis radiofrequency magnetron sputtering

 

作者: Gin‐ichiro Oya,   Chien Chen Diao,   Syozo Imai,   Takaaki Uzawa,   Yasuji Sawada,   Tokuko Sugai,   Kensuke Nakajima,   Tsutomu Yamashita,  

 

期刊: Journal of Applied Physics  (AIP Available online 1995)
卷期: Volume 77, issue 11  

页码: 5809-5818

 

ISSN:0021-8979

 

年代: 1995

 

DOI:10.1063/1.359160

 

出版商: AIP

 

数据来源: AIP

 

摘要:

(110)‐ and (103)‐oriented almost stoichiometric YBa2Cu3O7−&dgr;(YBCO) films have been grown epitaxially on hot SrTiO3(110) substrates using a 90° off‐axis rf magnetron sputtering technique, for fabrication of vertical sandwich‐type YBCO/insulator/YBCO or YBCO/normal metal/YBCO Josephson junctions utilizing the high‐quality YBCO films. The YBCO epitaxial films with high transition temperaturesTcof ∼90 K have been depositedinsituonly under the conditions of substrate temperaturesTsof ∼650–∼700 °C and oxygen partial pressurePO2of ∼5×10−3–∼10×10−3Torr, which are in close proximity to the critical stability/decomposition line for YBa2Cu3O6in the ordinary Y–Ba–Cu–O phase diagram. Using a quadrupole mass spectrometer, a high density of atomic oxygen has directly been observed to be efficiently produced in the sputter glow discharge under the above optimum conditions ofPO2. This atomic oxygen has played a key role in promoting the formation of the perovskite structure and the epitaxial growth of the YBCO films. Furthermore, Shapiro steps have successfully been observed for a Nb–YBCO point‐contact junction, which is made by pressing a Nb needle on a surface‐etched YBCO epitaxial film, under 525.4 GHz submillimeter‐wave irradiation. ©1995 American Institute of Physics.

 

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