Reliable substrate temperature measurements for high temperature AlGaAs molecular‐beam epitaxy growth
作者:
S. Strite,
M. Kamp,
H. P. Meier,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1995)
卷期:
Volume 13,
issue 2
页码: 290-292
ISSN:1071-1023
年代: 1995
DOI:10.1116/1.588367
出版商: American Vacuum Society
关键词: TERNARY COMPOUNDS;ALUMINIUM ARSENIDES;GALLIUM ARSENIDES;MOLECULAR BEAM EPITAXY;TEMPERATURE MEASUREMENT;SUBSTRATES;CONTROL SYSTEMS;OPTICAL PYROMETERS;DESORPTION;TEMPERATURE RANGE 0400−1000 K;(Al,Ga)As
数据来源: AIP
摘要:
We describe a reproducible and precise temperature control system for the molecular beam epitaxial growth of AlGaAs at substrate temperatures in the 700 °C range. Coating of the optical pyrometer window was observed to dramatically affect the pryometer readings making it an unreliable temperature measurement technique. By observing pyrometer interference oscillations during both GaAs and AlGaAs epitaxy, the Ga desorption rate during AlGaAs growth was estimated. The known temperature dependence of the Ga desorption rate allowed the substrate temperature to be calculated, and corrected, when necessary, during the growth. This method allowed the absolute AlGaAs substrate temperature to be controlled within ±3 °C over a six month production cycle.
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