We have developed a technique to write nanometer‐scale features on surfaces. The technique combines two of the most advanced technologies: the laser and the scanning tunneling microscope (STM). Laser radiation is used to break the chemical bonds of trimethylaluminum to free aluminum atoms in the region of the tunneling gap of the STM. The atoms are subsequently selectively excited and ionized. The ions are then driven softly toward the surface where they are deposited by the field in the tunneling gap of the microscope. Since the field of the tip can be confined to a few nanometers, the writing can be controlled with such resolution. The technique is also capable of filling holes and addressable nondestructive erasing.