Hole injection into silicon nitride: Dark current dependence on electrode materials and insulator thickness
作者:
P. C. Arnett,
D. J. DiMaria,
期刊:
Applied Physics Letters
(AIP Available online 1975)
卷期:
Volume 27,
issue 1
页码: 34-36
ISSN:0003-6951
年代: 1975
DOI:10.1063/1.88256
出版商: AIP
数据来源: AIP
摘要:
Dark currents in MNS capacitors are studied as a function of metal electrode material and insulator thickness. Dark currents sensitively reflect different electrode materials for thin (∼200 A˚) nitride films. Thus, it is found that high‐work‐function metals increase conduction under metal positive bias by enhanced hole injection and low‐work‐function metals increase conduction under metal negative bias by enhanced electron injection. Similar polarity differences are observed betwenn‐type andp‐type degenerate Si substrates. These contact differences disappear as the nitride becomes thicker and the thickness of trapped space‐charge layers near the contacts becomes small compared to the nitride thickness.
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