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A high-resolution scanning Kelvin probe microscope for contact potential measurements on the 100 nm scale

 

作者: W. Nabhan,   B. Equer,   A. Broniatowski,   G. De Rosny,  

 

期刊: Review of Scientific Instruments  (AIP Available online 1997)
卷期: Volume 68, issue 8  

页码: 3108-3111

 

ISSN:0034-6748

 

年代: 1997

 

DOI:10.1063/1.1148251

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The article describes the principles and current performance of a scanning Kelvin probe microscope for contact potential measurements with a lateral resolution on the 100 nm scale and a sensitivity in the millivolt range. Preliminary results are presented regarding the variation of the surface potential across charged grain boundaries in polycrystalline silicon. ©1997 American Institute of Physics.

 

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