A high-resolution scanning Kelvin probe microscope for contact potential measurements on the 100 nm scale
作者:
W. Nabhan,
B. Equer,
A. Broniatowski,
G. De Rosny,
期刊:
Review of Scientific Instruments
(AIP Available online 1997)
卷期:
Volume 68,
issue 8
页码: 3108-3111
ISSN:0034-6748
年代: 1997
DOI:10.1063/1.1148251
出版商: AIP
数据来源: AIP
摘要:
The article describes the principles and current performance of a scanning Kelvin probe microscope for contact potential measurements with a lateral resolution on the 100 nm scale and a sensitivity in the millivolt range. Preliminary results are presented regarding the variation of the surface potential across charged grain boundaries in polycrystalline silicon. ©1997 American Institute of Physics.
点击下载:
PDF
(1435KB)
返 回