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An investigation of the alloying technique for the fabrication of germaniump–n–ptransistors

 

作者: R.E.Warren,   H.Yemm,  

 

期刊: Proceedings of the IEE - Part B: Electronic and Communication Engineering  (IET Available online 1959)
卷期: Volume 106, issue 17S  

页码: 1176-1181

 

年代: 1959

 

DOI:10.1049/pi-b-2.1959.0214

 

出版商: IEE

 

数据来源: IET

 

摘要:

The base width of a transistor is an important factor affecting the cut-off frequency, current gain and maximum collector voltage. The paper is concerned with the manner in which wafer thickness, size of indium dots, alloying temperature, flatness of junction, furnace atmosphere and junction area affect the limits that can be achieved in the alloying process.

 

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