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Energy levels and solubility of interstitial chromium in silicon

 

作者: H. Feichtinger,   R. Czaputa,  

 

期刊: Applied Physics Letters  (AIP Available online 1981)
卷期: Volume 39, issue 9  

页码: 706-708

 

ISSN:0003-6951

 

年代: 1981

 

DOI:10.1063/1.92856

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The electronic level of interstitial Cr in silicon according to the transition Cr0i→Cr+i(3d6→3d5) was determined by correlating the electron paramagnetic resonance (EPR) signal of Cr+to Hall measurements on identical samples. The procedure gives the donor level located atEc−0.222±0.005 eV. From the experiments may be inferred that there is no Cr++istate aboveEv+0.05 eV. The solubility of interstitial Cr in silicon is retrograde at 1300° and has a maximum value of 5×1015cm−3.

 

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