Energy levels and solubility of interstitial chromium in silicon
作者:
H. Feichtinger,
R. Czaputa,
期刊:
Applied Physics Letters
(AIP Available online 1981)
卷期:
Volume 39,
issue 9
页码: 706-708
ISSN:0003-6951
年代: 1981
DOI:10.1063/1.92856
出版商: AIP
数据来源: AIP
摘要:
The electronic level of interstitial Cr in silicon according to the transition Cr0i→Cr+i(3d6→3d5) was determined by correlating the electron paramagnetic resonance (EPR) signal of Cr+to Hall measurements on identical samples. The procedure gives the donor level located atEc−0.222±0.005 eV. From the experiments may be inferred that there is no Cr++istate aboveEv+0.05 eV. The solubility of interstitial Cr in silicon is retrograde at 1300° and has a maximum value of 5×1015cm−3.
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