Preparation of ferroelectric BaTiO3thin films by activated reactive evaporation
作者:
K. Iijima,
T. Terashima,
K. Yamamoto,
K. Hirata,
Y. Bando,
期刊:
Applied Physics Letters
(AIP Available online 1990)
卷期:
Volume 56,
issue 6
页码: 527-529
ISSN:0003-6951
年代: 1990
DOI:10.1063/1.103300
出版商: AIP
数据来源: AIP
摘要:
Ferroelectric BaTiO3thin films were directly and epitaxially grown on SrTiO3single crystal and epitaxial Pt film substrates by activated reactive evaporation. The substrate temperature was around 600 °C. For (100) oriented as‐grown films, a typical ferroelectric hysteresis loop and a maximum of dielectric constant at about 115 °C were observed. The resistivity was as high as 109&OHgr; cm and the breakdown voltage was 2.7 MV/cm for as‐grown BaTiO3films.
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