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Preparation of ferroelectric BaTiO3thin films by activated reactive evaporation

 

作者: K. Iijima,   T. Terashima,   K. Yamamoto,   K. Hirata,   Y. Bando,  

 

期刊: Applied Physics Letters  (AIP Available online 1990)
卷期: Volume 56, issue 6  

页码: 527-529

 

ISSN:0003-6951

 

年代: 1990

 

DOI:10.1063/1.103300

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Ferroelectric BaTiO3thin films were directly and epitaxially grown on SrTiO3single crystal and epitaxial Pt film substrates by activated reactive evaporation. The substrate temperature was around 600 °C. For (100) oriented as‐grown films, a typical ferroelectric hysteresis loop and a maximum of dielectric constant at about 115 °C were observed. The resistivity was as high as 109&OHgr; cm and the breakdown voltage was 2.7 MV/cm for as‐grown BaTiO3films.

 

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