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Room‐temperature oxidation of Ni, Pd, and Pt silicides

 

作者: A. Cros,   R. A. Pollak,   K. N. Tu,  

 

期刊: Journal of Applied Physics  （AIP Available online 1985）
卷期: Volume 57, issue 6  

页码: 2253-2257

 

ISSN:0021-8979

 

年代: 1985

 

DOI:10.1063/1.334371

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The room‐temperature oxidation of Ni, Pd, and Pt silicides has been studied using electron spectroscopy for chemical analysis. It has been found that (1) Si atoms oxidize predominantly, (2) the oxidation of Si is enhanced in the metal‐rich silicides, and (3) the growth of the surface oxide layer leaves behind a phase enriched with metal.

 

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