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Cesium mixing in the multi‐ampere volume H−ion source

 

作者: Y. Okumura,   M. Hanada,   T. Inoue,   H. Kojima,   Y. Matsuda,   Y. Ohara,   M. Seki,   K. Watanabe,  

 

期刊: AIP Conference Proceedings  (AIP Available online 1990)
卷期: Volume 210, issue 1  

页码: 169-183

 

ISSN:0094-243X

 

年代: 1990

 

DOI:10.1063/1.39587

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A 7.8 A, 50 keV H−ion beam was produced by a cesium seeded volume negative ion source. The source consists of a 25 cm×46 cm rectangular multicusp plasma generator and a 14 cm×36 cm multiaperture extractor. Without cesium, the source produced 3.4 A, 75 keV H−ion beams. By seeding a small amount of cesium, we observed a big enhancement of H−production efficiency by a factor of four, and a reduction of optimum operating pressure. Extracted electron current decreased to almost zero when we biased the plasma grid positive with respect to the anode. The effect lasted for more than a week once the cesium was injected for several seconds at an oven temperature of 280–300 °C.

 

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