Cesium mixing in the multi‐ampere volume H−ion source
作者:
Y. Okumura,
M. Hanada,
T. Inoue,
H. Kojima,
Y. Matsuda,
Y. Ohara,
M. Seki,
K. Watanabe,
期刊:
AIP Conference Proceedings
(AIP Available online 1990)
卷期:
Volume 210,
issue 1
页码: 169-183
ISSN:0094-243X
年代: 1990
DOI:10.1063/1.39587
出版商: AIP
数据来源: AIP
摘要:
A 7.8 A, 50 keV H−ion beam was produced by a cesium seeded volume negative ion source. The source consists of a 25 cm×46 cm rectangular multicusp plasma generator and a 14 cm×36 cm multiaperture extractor. Without cesium, the source produced 3.4 A, 75 keV H−ion beams. By seeding a small amount of cesium, we observed a big enhancement of H−production efficiency by a factor of four, and a reduction of optimum operating pressure. Extracted electron current decreased to almost zero when we biased the plasma grid positive with respect to the anode. The effect lasted for more than a week once the cesium was injected for several seconds at an oven temperature of 280–300 °C.
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