Optical emission spectroscopy of reactive plasmas: A method for correlating emission intensities to reactive particle density
作者:
J. W. Coburn,
M. Chen,
期刊:
Journal of Applied Physics
(AIP Available online 1980)
卷期:
Volume 51,
issue 6
页码: 3134-3136
ISSN:0021-8979
年代: 1980
DOI:10.1063/1.328060
出版商: AIP
数据来源: AIP
摘要:
The addition of a small concentration of suitably chosen noble gas to a reactive plasma is shown to permit the determination of the functional dependence of reactive particle density on plasma parameters. Examples illustrating the simplicity of this method are presented using F atomic emission from plasma‐etching discharges and a comparison is made to available data in the literature.
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