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Optical emission spectroscopy of reactive plasmas: A method for correlating emission intensities to reactive particle density

 

作者: J. W. Coburn,   M. Chen,  

 

期刊: Journal of Applied Physics  (AIP Available online 1980)
卷期: Volume 51, issue 6  

页码: 3134-3136

 

ISSN:0021-8979

 

年代: 1980

 

DOI:10.1063/1.328060

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The addition of a small concentration of suitably chosen noble gas to a reactive plasma is shown to permit the determination of the functional dependence of reactive particle density on plasma parameters. Examples illustrating the simplicity of this method are presented using F atomic emission from plasma‐etching discharges and a comparison is made to available data in the literature.

 

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