TUNNELING INTO AMORPHOUS GERMANIUM FILMS
作者:
A. Nwachuku,
M. Kuhn,
期刊:
Applied Physics Letters
(AIP Available online 1968)
卷期:
Volume 12,
issue 5
页码: 163-165
ISSN:0003-6951
年代: 1968
DOI:10.1063/1.1651936
出版商: AIP
数据来源: AIP
摘要:
Electron tunneling into amorphous germanium films was studied using Al&sngbnd;Al2O3&sngbnd;Ge tunnel junctions. A ``conductance well'' was observed, which is related to the band edges of the amorphous germanium film and its surface potential. Structure in the conductance well is interpreted as tunneling into gap states. The results suggest tunneling as a possible tool for the study of band structure in amorphous materials.
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