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TUNNELING INTO AMORPHOUS GERMANIUM FILMS

 

作者: A. Nwachuku,   M. Kuhn,  

 

期刊: Applied Physics Letters  (AIP Available online 1968)
卷期: Volume 12, issue 5  

页码: 163-165

 

ISSN:0003-6951

 

年代: 1968

 

DOI:10.1063/1.1651936

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Electron tunneling into amorphous germanium films was studied using Al&sngbnd;Al2O3&sngbnd;Ge tunnel junctions. A ``conductance well'' was observed, which is related to the band edges of the amorphous germanium film and its surface potential. Structure in the conductance well is interpreted as tunneling into gap states. The results suggest tunneling as a possible tool for the study of band structure in amorphous materials.

 

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