A 1.9 eV photoluminescence induced by 4 eV photons in high‐purity wet synthetic silica
作者:
A. Anedda,
G. Bongiovanni,
M. Cannas,
F. Congiu,
A. Mura,
M. Martini,
期刊:
Journal of Applied Physics
(AIP Available online 1993)
卷期:
Volume 74,
issue 11
页码: 6993-6995
ISSN:0021-8979
年代: 1993
DOI:10.1063/1.355053
出版商: AIP
数据来源: AIP
摘要:
Photoluminescence (PL) of type III (high‐purity wet synthetic) silica excited by a XeCl excimer laser (h&ngr;=4 eV) is reported. Time‐resolved spectra show that a PL band peaked at 1.9 eV can be induced by the XeCl laser irradiation. This band exhibits a fast rise time (<20 ns) but a decay time of several microseconds. The possible mechanisms of photogeneration and photoexcitation of the defects related to this emission are discussed.
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