An ultra‐low stress tungsten absorber for x‐ray masks
作者:
Masamitsu Itoh,
Masaru Hori,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1991)
卷期:
Volume 9,
issue 1
页码: 165-168
ISSN:1071-1023
年代: 1991
DOI:10.1116/1.585280
出版商: American Vacuum Society
关键词: ABSORBERS;TUNGSTEN;X−RAY EQUIPMENT;STRESSES;THIN FILMS;THICKNESS;DEPOSITION;MAGNETRONS;SPUTTERING;ARGON;ION IMPLANTATION;SILICON IONS;NEON IONS;ARGON IONS;KRYPTON IONS;STABILITY;OPTIMIZATION
数据来源: AIP
摘要:
A stress compensation technique for a tungsten (W) absorber for an x‐ray mask has been developed. Tungsten films with a thickness of 500 nm were deposited using the magnetron dc sputtering method in an argon (Ar) working gas at a power of 1 kW. A high film density (18.0 g/cm3) was obtained at a low working gas pressure. Neon (Ne), Ar, krypton (Kr) and silicon (Si) ion implantations were performed with a projection range (Rp) of 50 nm, at doses of 1014–1015ions/cm2to modify the absorber stress. The ion implantation reduced the film stress to less than 5×107dyn/cm2. Ar and Kr implanted film stress stability was less than 5×107dyn/cm2. Ne and Si implanted film stresses were not stable.
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