Fabrication of nanostructures using atomic‐force‐microscope‐based lithography
作者:
L. L. Sohn,
R. L. Willett,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 67,
issue 11
页码: 1552-1554
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.114731
出版商: AIP
数据来源: AIP
摘要:
We describe a novel technique for fabricating metallic nanostructures on an arbitrary substrate using an atomic force microscope (AFM). An AFM is used to plow a pattern through the top of two resist layers spun onto a substrate. The resist is then developed to create a mask through which material can be deposited. By changing the applied force, the top resist‐layer thickness, or the development time, the linewidth can be varied. Continuous metallic wires ∼500 A˚×400 A˚×15 &mgr;m have been fabricated on bare substrates and between contact pads. ©1995 American Institute of Physics.
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