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XeF excimer laser pumped in a longitudinal low‐pressure discharge

 

作者: P. Burkhard,   T. Gerber,   W. Lu¨thy,  

 

期刊: Applied Physics Letters  （AIP Available online 1981）
卷期: Volume 39, issue 1  

页码: 19-20

 

ISSN:0003-6951

 

年代: 1981

 

DOI:10.1063/1.92547

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Results of a new excitation technique for excimer lasers are reported. The B→X band of Xef at 352 nm has been pumped in a longitudinal low‐pressure discharge. Low‐power, 20‐nsec laser pulses of high beam quality have been generated.

 

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