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LiNbO3phase gratings prepared by a single excimer pulse through a silica phase mask

 

作者: G. P. Luo,   Y. L. Lu,   Y. Q. Lu,   X. L. Guo,   S. B. Xiong,   C. Z. Ge,   Y. Y. Zhu,   Z. G. Liu,   N. B. Ming,   J. W. Wu,   D. S. Ding,   Z. H. Lu,  

 

期刊: Applied Physics Letters  （AIP Available online 1996）
卷期: Volume 69, issue 10  

页码: 1352-1354

 

ISSN:0003-6951

 

年代: 1996

 

DOI:10.1063/1.117433

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A transmission silica phase mask grating was used to fabricate LiNbO3wafer phase gratings by a single excimer pulse at 248 nm. The morphologies of the LiNbO3wafer gratings were studied with an atomic force microscope as well as an optical microscope. The crystal structures of the gratings were characterized by x‐ray diffraction and three new crystal phases were found at the gratings’ surface besides the substrate phase of LN (110). ©1996 American Institute of Physics.

 

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