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Al/Al2O3/Al single electron transistors operable up to 30 K utilizing anodization controlled miniaturization enhancement

 

作者: Y. Nakamura,   D. L. Klein,   J. S. Tsai,  

 

期刊: Applied Physics Letters  (AIP Available online 1996)
卷期: Volume 68, issue 2  

页码: 275-277

 

ISSN:0003-6951

 

年代: 1996

 

DOI:10.1063/1.115661

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We have developed a method, anodization controlled miniaturization enhancement (ACME), to make ultrasmall tunnel junctions. Anodization of electron‐beam fabricated Al/Al2O3/Al tunnel junctions reduces their effective areas and capacitances, which realizes single electron transistors operating at high temperatures up to nearly 30 K. The limit of the increase in the charging energy is attributed to the initial scattering in the junction sizes. ©1996 American Institute of Physics.

 

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