Variation of composition of sputtered TiN films as a function of target nitridation, thermal anneal, and substrate topography
作者:
W. Tsai,
D. Hodul,
T. Sheng,
S. Dew,
K. Robbie,
M. J. Brett,
T. Smy,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 67,
issue 2
页码: 220-222
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.114673
出版商: AIP
数据来源: AIP
摘要:
The chemical composition of reactively sputtered TiN was measured with RBS and AES for aspect ratio 2 topography as a function of Ti target nitridation. The bottom of the aspect ratio 2 topography was nitrogen depleted (Ti:N=1.78:1) as compared to the field (Ti:N=1.01:1) for films sputtered with a non‐nitrided target at 20 kW and 400 °C. No such depletion effect was observed for TiN films sputtered with a nitrided target. Thermal annealing of the depleted TiN films at 450 °C in N2restored the composition to near‐stoichiometric.SIMBADsimulation with a saturation‐dependent nitrogen sticking coefficient was used to understand the nature of the nitrogen depletion. ©1995 American Institute of Physics.
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