Association of super-advanced electronics technologies (ASET) is a Japanese electronics research and development consortium that was founded on 29 February 1996. The target of the plasma research group in ASET is to make breakthroughs for future dry etching technology by investigating the mechanisms of dry etching scientifically. The plasma research group is investigating plasma diagnostics, plasma generation and its transportation, plasma surface reaction and vapor phase reaction, plasma modeling/simulation directed toward plasma control, and the mechanism of silicon oxide etching in high aspect ratio, narrow contact holes, and will develop a new chemistry, a new plasma source, and a new monitoring method.