p-type InP/Langmuir film m.i.s. diodes
作者:
R.W.Sykes,
G.G.Roberts,
T.Fok,
D.T.Clark,
期刊:
IEE Proceedings I (Solid-State and Electron Devices)
(IET Available online 1980)
卷期:
Volume 127,
issue 3
页码: 137-139
年代: 1980
DOI:10.1049/ip-i-1.1980.0026
出版商: IEE
数据来源: IET
摘要:
The paper reports for the first time the m.i.s. characteristics ofp-type InP structures preparaed using a low temperature method. With organic films deposited using the langmuir-Blodgett technique, fairly conventionalCVdata have been obtained for both bulk single crystals and epitaxial layers, showing that at zero bias, the surface is depleted. Conductance peaks have been observed using weak illumination. The paper also contains a discussion of the principal factors influencing the interaface properties, including substrate etching prior to thin-film deposition.
点击下载:
PDF
(404KB)
返 回