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p-type InP/Langmuir film m.i.s. diodes

 

作者: R.W.Sykes,   G.G.Roberts,   T.Fok,   D.T.Clark,  

 

期刊: IEE Proceedings I (Solid-State and Electron Devices)  (IET Available online 1980)
卷期: Volume 127, issue 3  

页码: 137-139

 

年代: 1980

 

DOI:10.1049/ip-i-1.1980.0026

 

出版商: IEE

 

数据来源: IET

 

摘要:

The paper reports for the first time the m.i.s. characteristics ofp-type InP structures preparaed using a low temperature method. With organic films deposited using the langmuir-Blodgett technique, fairly conventionalCVdata have been obtained for both bulk single crystals and epitaxial layers, showing that at zero bias, the surface is depleted. Conductance peaks have been observed using weak illumination. The paper also contains a discussion of the principal factors influencing the interaface properties, including substrate etching prior to thin-film deposition.

 

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