Lateral epitaxy of low defect density GaN layers via organometallic vapor phase epitaxy
作者:
Ok-Hyun Nam,
Michael D. Bremser,
Tsvetanka S. Zheleva,
Robert F. Davis,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 71,
issue 18
页码: 2638-2640
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.120164
出版商: AIP
数据来源: AIP
摘要:
Organometallic vapor phase lateral epitaxy and coalescence of GaN layers originating from GaN stripes deposited within 3-&mgr;m-wide windows spaced 3 &mgr;m apart and contained inSiO2masks on GaN/AlN/6H–SiC(0001) substrates are reported. The extent and microstructural characteristics of the lateral overgrowth were a strong function of stripe orientation. A high density of threading dislocations, originating from the interface of the underlying GaN with the AlN buffer layer, were contained in the GaN grown in the window regions. The overgrowth regions, by contrast, contained a very low density of dislocations. The coalesced layers had a rms surface roughness of 0.25 nm. ©1997 American Institute of Physics.
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