Suppression of Be diffusion in molecular‐beam epitaxy AlGaAs by the incorporation of In for heterojunction bipolar transistor applications
作者:
T. Fujii,
T. Tomioka,
H. Ishikawa,
S. Sasa,
A. Endoh,
Y. Bamba,
K. Ishii,
Y. Kataoka,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena
(AIP Available online 1990)
卷期:
Volume 8,
issue 2
页码: 154-156
ISSN:0734-211X
年代: 1990
DOI:10.1116/1.584843
出版商: American Vacuum Society
关键词: BERYLLIUM;DIFFUSION;MOLECULAR BEAM EPITAXY;ALUMINIUM ALLOYS;GALLIUM ALLOYS;ARSENIC ALLOYS;INDIUM ALLOYS;EPITAXIAL LAYERS;DOPED MATERIALS;HIGH TEMPERATURE;BIPOLAR TRANSISTORS;III−V SEMICONDUCTORS;(Al,Ga)As:Be;(Al,Ga)In:Be
数据来源: AIP
摘要:
We report for the first time on the suppression of Be diffusion in molecular‐beam epitaxy Al0.1Ga0.9As by incorporating In into the epilayer. The minimum diffusion coefficient of Be‐doped Iny(Al0.1Ga0.9)1−yAs layers with a carrier concentration of 7×1019cm−3and an InAs mole fraction of 0.07 grown at 600 °C was about 2×10−15cm2/s, which is five times smaller than that without In incorporation. The photoluminescence intensity of the layers drastically decreased above a value ofyof 0.05, probably due to crystal degradation resulting from misfit dislocations. A heterojunction bipolar transistor with a 100 nm‐thickp+In0.055(AlxGa1−x)0.945As base layer (Al graded compositionx: 0 to 0.1, emitter area: 4×5 μm2) yielded a dc current gain of 27 at a collector current of 8 mA.
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