Sputtering of uranium tetrafluoride in the electronic stopping region
作者:
J.E. Griffith,
R.A. Weller,
L.E. Seiberling,
T.A. Tombrello,
期刊:
Radiation Effects
(Taylor Available online 1980)
卷期:
Volume 51,
issue 3-4
页码: 223-231
ISSN:0033-7579
年代: 1980
DOI:10.1080/00337578008210004
出版商: Taylor & Francis Group
数据来源: Taylor
摘要:
We have studied the sputtering of235U from UF4surfaces by ions with energies in the electronic stopping region. The observed sputtering yields are very large and are associated with the electronic stopping power. Measured yields produced by19F ions at energies ranging from 1/16 MeV/amu to 1½ Mev/amu exhibit a peak ofS= 7.1 ± 1.5 for19F+3at an energy of ¼ MeV/amu. The data suggest that the yield depends on the charge state of the incident ion. The yields are independent of target temperature in the range between 70°C and 170°C. The energy spectrum of the neutral component of the sputtered particles produced by ¼ MeV/amu19F+2has been measured with the mechanical time-of-flight spectrometer developed by Weller and Tombrello. The spectrometer data indicate that a large fraction of the sputtered particles is charged. We also describe the behavior of high energy sputtering of UF4by4He,16O and20Ne. Experiments with16O and20Ne beams at 100 keV show that the Sigmund theory adequately describes the sputtering of UF4in the nuclear stopping region.
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