Real time monitoring of the growth of transparent thin films by spectroscopic ellipsometry
作者:
M. Kildemo,
B. Dre´villon,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 67,
issue 7
页码: 918-920
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.114694
出版商: AIP
数据来源: AIP
摘要:
Real time monitoring of the growth of plasma deposited transparent thin films by spectroscopic phase modulated ellipsometry (SPME) is presented. Two on‐line methods of determination of the refractive indexnand the film thicknessdare evaluated. The first one is based on the fast inversion of the Fresnel equations (0.2 s with a conventional PC 486 computer). Combining the measurements simultaneously recorded at two photon energies, a 5% relative precision is obtained on 5–6000 A˚ thick films even deposited at high deposition rate (32 A˚ s−1). On the other hand, a better precision can be obtained using a least squares fit procedure based on single photon energy SPME measurements. In the latter case, it is shown that the productndcan be determined with a 1% precision, up to 6000 A˚. ©1995 American Institute of Physics.
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