首页   按字顺浏览 期刊浏览 卷期浏览 Active Oxidation of SiC‐Based Ceramics in Ar–2% Cl2‐O2Gas Mixtures at 1000°C
Active Oxidation of SiC‐Based Ceramics in Ar–2% Cl2‐O2Gas Mixtures at 1000°C

 

作者: Sik Y. Ip,   Michael J. McNallan,   Dong S. Park,  

 

期刊: Journal of the American Ceramic Society  (WILEY Available online 1992)
卷期: Volume 75, issue 7  

页码: 1942-1948

 

ISSN:0002-7820

 

年代: 1992

 

DOI:10.1111/j.1151-2916.1992.tb07221.x

 

出版商: Blackwell Publishing Ltd

 

关键词: silicon carbide;oxidation;argon;chlorine;oxygen

 

数据来源: WILEY

 

摘要:

The corrosion in Ar–2% CI2gas mixtures of four low‐cost SiC‐based materials suitable for use in high‐temperature heat exchangers has been invesigated. The oxygen potential was controlled by addition of O2or H2at 1000°C. Little attack was observed in the reducing environment composed of Ar–2% Cl2–1% H2or the oxidizing environment composed of Ar–2% Cl2–20% O2but all of the materials were subject to active corrosion at intermediate oxygen potentials. Selective attack of the free silicon phase was obsrved for the siliconized silicon carbide materials. The severity of the active oxidation and the oxygen potentital at which the corrosion changed from active to passive were affected by the nature of the sintering aids used

 

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