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Struktur und photochemische Reaktivität: Photohydrolyse von Trifluormethylsubstituierten Phenolen und Naphtholen

 

作者: P. Seiler,   J. Wirz,  

 

期刊: Helvetica Chimica Acta  (WILEY Available online 1972)
卷期: Volume 55, issue 8  

页码: 2693-2712

 

ISSN:0018-019X

 

年代: 1972

 

DOI:10.1002/hlca.19720550802

 

出版商: WILEY‐VCH Verlag GmbH

 

数据来源: WILEY

 

摘要:

AbstractIrradiation of trifluoromethylphenols (three isomers) and ‐naphthols (eight isomers) in water solution yields the corresponding hydroxybenzoic and naphthoic acids, respectively. The reaction mechanism has been investigated by means of flash photolysis and quenching experiments. It is proposed that the photohydrolysis is initiated in the lowest excited singlet state by a heterolytic CF bond cleavage. The observed photochemical and thermal reaction rates as well as the shifts of the lowest electronic transitions upon CF3‐substitution compare well with predictions from semiempirical π‐electron calculations (PPP SCF CI). A rationale for the correlation between excited state charge densities and photochemical reactivity is given. pK values for the ground state and first excited singlet state are

 

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