Study of the discharge cleaning process in JIPP T‐II torus by residual gas analyzer
作者:
N. Noda,
S. Hirokura,
Y. Taniguchi,
S. Tanahashi,
期刊:
Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films
(AIP Available online 1983)
卷期:
Volume 1,
issue 3
页码: 1430-1434
ISSN:0734-2101
年代: 1983
DOI:10.1116/1.572035
出版商: American Vacuum Society
关键词: tokamak devices;electric discharges;plasma;impurities;optimization;plasma density;electron temperature;jippt−2 device;cleaning
数据来源: AIP
摘要:
After several hours of discharge cleaning, it has been observed that the decay time of the water‐vapor partial pressure changes from one well defined value to another. A long decay time observed in the later phase can be interpreted as a result of a slow deoxidization rate of chromium oxide, which may dominate the cleaning process in this phase. Optimization of the electron density for the cleaning is discussed, comparing the experimental results on density dependence of the water‐vapor partial pressure with a result based on a zero‐dimensional calculation for particle balance. One of the essential points for effective cleaning is found to be raising the electron density of the plasma high enough that the dissociation loss rate of H2O is as large as the sticking loss rate. A density as high as 1011cm−3is required for a clean surface condition where sticking probability is presumed to be around 0.5.
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