首页   按字顺浏览 期刊浏览 卷期浏览 Study of the discharge cleaning process in JIPP T‐II torus by residual gas analyzer
Study of the discharge cleaning process in JIPP T‐II torus by residual gas analyzer

 

作者: N. Noda,   S. Hirokura,   Y. Taniguchi,   S. Tanahashi,  

 

期刊: Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films  (AIP Available online 1983)
卷期: Volume 1, issue 3  

页码: 1430-1434

 

ISSN:0734-2101

 

年代: 1983

 

DOI:10.1116/1.572035

 

出版商: American Vacuum Society

 

关键词: tokamak devices;electric discharges;plasma;impurities;optimization;plasma density;electron temperature;jippt−2 device;cleaning

 

数据来源: AIP

 

摘要:

After several hours of discharge cleaning, it has been observed that the decay time of the water‐vapor partial pressure changes from one well defined value to another. A long decay time observed in the later phase can be interpreted as a result of a slow deoxidization rate of chromium oxide, which may dominate the cleaning process in this phase. Optimization of the electron density for the cleaning is discussed, comparing the experimental results on density dependence of the water‐vapor partial pressure with a result based on a zero‐dimensional calculation for particle balance. One of the essential points for effective cleaning is found to be raising the electron density of the plasma high enough that the dissociation loss rate of H2O is as large as the sticking loss rate. A density as high as 1011cm−3is required for a clean surface condition where sticking probability is presumed to be around 0.5.

 

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