首页   按字顺浏览 期刊浏览 卷期浏览 Electron and hole mobility intris(8‐hydroxyquinolinolato‐N1,O8) aluminum
Electron and hole mobility intris(8‐hydroxyquinolinolato‐N1,O8) aluminum

 

作者: R. G. Kepler,   P. M. Beeson,   S. J. Jacobs,   R. A. Anderson,   M. B. Sinclair,   V. S. Valencia,   P. A. Cahill,  

 

期刊: Applied Physics Letters  (AIP Available online 1995)
卷期: Volume 66, issue 26  

页码: 3618-3620

 

ISSN:0003-6951

 

年代: 1995

 

DOI:10.1063/1.113806

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We have measured the drift mobility of electrons and holes in thin, vapor‐deposited films oftris(8‐hydroxyquinolinolato‐N1,O8) aluminum using a time of flight photoconductivity technique. The drift of mobility of both carriers is dispersive and strongly electric field and temperature dependent. At ambient temperature and an electric field of 4×105V cm−1, the effective mobility of electrons and holes is 1.4×10−6and 2×10−8 cm2 V−1 s−1, respectively, in a 400 nm thick sample. ©1995 American Institute of Physics.

 

点击下载:  PDF (52KB)



返 回