Lift‐off lithography using an atomic force microscope
作者:
V. Bouchiat,
D. Esteve,
期刊:
Applied Physics Letters
(AIP Available online 1996)
卷期:
Volume 69,
issue 20
页码: 3098-3100
ISSN:0003-6951
年代: 1996
DOI:10.1063/1.117317
出版商: AIP
数据来源: AIP
摘要:
We present a technique to fabricate nanostructures with an atomic force microscope (AFM). By taking advantage of the AFM tip sharpness, we engrave a narrow furrow in a soft polyimide layer. The furrow is then transferred using dry etching to a thin germanium layer which forms a suspended mask. Metallic layers are then evaporated through this mask. Metallic lines with a 40 nm linewidth and single‐electron transistors have been fabricated. This lift‐off technique can be used on any substrate and allows easy alignment with previously fabricated structures. ©1996 American Institute of Physics.
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