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Mass spectroscopic identification of wavelength dependent UV laser photoablation fragments from polymethylmethacrylate

 

作者: R. C. Estler,   N. S. Nogar,  

 

期刊: Applied Physics Letters  (AIP Available online 1986)
卷期: Volume 49, issue 18  

页码: 1175-1177

 

ISSN:0003-6951

 

年代: 1986

 

DOI:10.1063/1.97406

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Samples of polymethylmethacrylate have been irradiated with laser pulses of 266 nm wavelength along with the wavelengths generated via hydrogen‐shifted stimulated Raman scattering. A quadrupole mass spectrometer monitors in real time the photoablation products produced during the irradiation. At wavelengths of 266 nm and above, the products are dominated by monomer, CO2, and CO. At wavelengths below 266 nm, a dramatic change of ablation products is observed, with methyl formate appearing as a major photochemical product.

 

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