Mass spectroscopic identification of wavelength dependent UV laser photoablation fragments from polymethylmethacrylate
作者:
R. C. Estler,
N. S. Nogar,
期刊:
Applied Physics Letters
(AIP Available online 1986)
卷期:
Volume 49,
issue 18
页码: 1175-1177
ISSN:0003-6951
年代: 1986
DOI:10.1063/1.97406
出版商: AIP
数据来源: AIP
摘要:
Samples of polymethylmethacrylate have been irradiated with laser pulses of 266 nm wavelength along with the wavelengths generated via hydrogen‐shifted stimulated Raman scattering. A quadrupole mass spectrometer monitors in real time the photoablation products produced during the irradiation. At wavelengths of 266 nm and above, the products are dominated by monomer, CO2, and CO. At wavelengths below 266 nm, a dramatic change of ablation products is observed, with methyl formate appearing as a major photochemical product.
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