Hydrogen effects on oxygen precipitation in Czochralski silicon crystals
作者:
Akito Hara,
Masaki Aoki,
Tetsuo Fukuda,
Akira Ohsawa,
期刊:
Journal of Applied Physics
(AIP Available online 1993)
卷期:
Volume 74,
issue 2
页码: 913-916
ISSN:0021-8979
年代: 1993
DOI:10.1063/1.354858
出版商: AIP
数据来源: AIP
摘要:
We reported enhanced oxygen precipitation in quenched Czochralski silicon crystals after solution annealing at 1270 °C in nitrogen or in dry oxygen [J. Appl. Phys.66, 3958 (1989)]. We attributed this phenomena to intrinsic point defects. However, hydrogen was introduced into samples during solution annealing at 1270 °C and aggregates of hydrogen were formed during quenching. This article examines hydrogen aggregates by Secco etching and transmission electron microscope. Hydrogen‐related aggregates are found to be related to enhanced oxygen precipitation.
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