PnpGaAs/Ge/Ge phototransistor grown by molecular beam epitaxy: Implications for bipolar and hot‐electron transistors
作者:
N. Chand,
J. Klem,
H. Morkoc¸,
期刊:
Applied Physics Letters
(AIP Available online 1986)
卷期:
Volume 48,
issue 7
页码: 484-486
ISSN:0003-6951
年代: 1986
DOI:10.1063/1.96483
出版商: AIP
数据来源: AIP
摘要:
In order to exploit the potential of GaAs/Ge heterojunctions for high‐speed heterojunction bipolar transistors and hot‐electron transistors, aPnpGaAs/Ge floating base phototransistor, sensitive to 1.1–1.55‐&mgr;m wavelength range, was made. The gallium‐doped Ge substrate was first exposed to the As2flux in the growth chamber of a molecular beam epitaxy system to form apnjunction in Ge. This was followed by the growth of ap‐type Be‐doped GaAs layer which served as the emitter. The fabricated mesa devices showed an optical gain of 85 at 1.15 &mgr;m incident wavelength. The gain was found to be nearly independent of the incident light power indicating good quality of the GaAs/Ge heterointerface.
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