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A model for MOS transistors

 

作者: G.S.Bhatti,   B.K.Jones,   P.C.Russell,  

 

期刊: IEE Proceedings I (Solid-State and Electron Devices)  (IET Available online 1985)
卷期: Volume 132, issue 6  

页码: 248-252

 

年代: 1985

 

DOI:10.1049/ip-i-1.1985.0055

 

出版商: IEE

 

数据来源: IET

 

摘要:

A model is presented for the operation of MOS transistors which is applicable to many power and short channel devices. This improved 1-dimensional charge control model allows for the effects of the mobility reduction due to the gate-channel field and to velocity saturation of the channel carriers under the high drainsource field. Experiments have verified the model fornandpchannel devices. The high drain voltageID/VGdata are compared with the model predictions using accepted experimental values of the bulk saturation velocity and velocity-field curves together with experimental measurements of the channel series resistance and the gate-field reduction of the mobility.

 

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