A model for MOS transistors
作者:
G.S.Bhatti,
B.K.Jones,
P.C.Russell,
期刊:
IEE Proceedings I (Solid-State and Electron Devices)
(IET Available online 1985)
卷期:
Volume 132,
issue 6
页码: 248-252
年代: 1985
DOI:10.1049/ip-i-1.1985.0055
出版商: IEE
数据来源: IET
摘要:
A model is presented for the operation of MOS transistors which is applicable to many power and short channel devices. This improved 1-dimensional charge control model allows for the effects of the mobility reduction due to the gate-channel field and to velocity saturation of the channel carriers under the high drainsource field. Experiments have verified the model fornandpchannel devices. The high drain voltageID/VGdata are compared with the model predictions using accepted experimental values of the bulk saturation velocity and velocity-field curves together with experimental measurements of the channel series resistance and the gate-field reduction of the mobility.
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