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Microwave surface resistance of magnetron‐sputtered Tl‐Ba‐Ca‐Cu‐O films on silver substrates

 

作者: D. W. Cooke,   E. R. Gray,   P. N. Arendt,   G. A. Reeves,   R. J. Houlton,   N. E. Elliott,   D. R. Brown,  

 

期刊: Applied Physics Letters  (AIP Available online 1990)
卷期: Volume 56, issue 21  

页码: 2147-2149

 

ISSN:0003-6951

 

年代: 1990

 

DOI:10.1063/1.102954

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Surface resistance measurements on Tl‐Ba‐Ca‐Cu‐O thick films (∼15 &mgr;m) magnetron sputtered onto BaF2‐buffered, silver‐based (Consil 995) substrates have been made at a microwave frequency of 22 GHz. The relatively large‐area films (∼5 cm2) are characterized by surface resistance values of 6.9±2 m&OHgr; at 11.3 K and 30.2±1 m&OHgr; at 77 K; the corresponding values for Cu are 10 and 22 m&OHgr;, respectively. These results demonstrate that Tl‐Ba‐Ca‐Cu‐O can be deposited ontolarge‐area,metallicsubstrates with characteristic surface resistance values lower than Cu at 4 K. Orientation of the film should improve the surface resistance at 77 K, thereby making the fabrication of microwave cavities that are superior to Cu possible.

 

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