Microwave surface resistance of magnetron‐sputtered Tl‐Ba‐Ca‐Cu‐O films on silver substrates
作者:
D. W. Cooke,
E. R. Gray,
P. N. Arendt,
G. A. Reeves,
R. J. Houlton,
N. E. Elliott,
D. R. Brown,
期刊:
Applied Physics Letters
(AIP Available online 1990)
卷期:
Volume 56,
issue 21
页码: 2147-2149
ISSN:0003-6951
年代: 1990
DOI:10.1063/1.102954
出版商: AIP
数据来源: AIP
摘要:
Surface resistance measurements on Tl‐Ba‐Ca‐Cu‐O thick films (∼15 &mgr;m) magnetron sputtered onto BaF2‐buffered, silver‐based (Consil 995) substrates have been made at a microwave frequency of 22 GHz. The relatively large‐area films (∼5 cm2) are characterized by surface resistance values of 6.9±2 m&OHgr; at 11.3 K and 30.2±1 m&OHgr; at 77 K; the corresponding values for Cu are 10 and 22 m&OHgr;, respectively. These results demonstrate that Tl‐Ba‐Ca‐Cu‐O can be deposited ontolarge‐area,metallicsubstrates with characteristic surface resistance values lower than Cu at 4 K. Orientation of the film should improve the surface resistance at 77 K, thereby making the fabrication of microwave cavities that are superior to Cu possible.
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